Goal

Provide optimization based tools to improve the design and performance of chemical vapor deposition (CVD) reactors used in semiconductor processing.

Project Description

Small-batch fast-ramp low pressure CVD furnace.

Chemical vapor deposition (CVD) is used extensively in the manufacturing of semiconductors. As CVD reactors, such as small-batch fast-ramp low pressure CVD furnaces become increasingly expensive, there is a higher payoff for increased reactor throughput or for an increase in the number of usable wafers. Computational simulation combined with optimization are powerful and efficient tools to achieve these objectives.